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High Resolution Projection Micro Stereolithography System And Method

United States Patent Application

View the Complete Application at the US Patent & Trademark Office
Lawrence Livermore National Laboratory - Visit the Industrial Partnerships Office Website
A high-resolution system and method incorporating one or more of the following features with a standard system using a SLM projected digital image to form components in a stereolithographic bath: a far-field superlens for producing sub-diffraction-limited features, multiple spatial light modulators (SLM) to generate spatially-controlled three-dimensional interference holograms with nanoscale features, and the integration of microfluidic components into the resin bath of a system to fabricate microstructures of different materials.
Spadaccini, Christopher M. (Oakland, CA), Farquar, George (Livermore, CA), Weisgraber, Todd (Brentwood, CA), Gemberling, Steven (Livermore, CA), Fang, Nicholas (Champaign, IL), Xu, Jun (Urbana, IL), Alonso, Matthew (Freeport, IL), Lee, Howon (Urbana, IL)
Lawrence Livermore National Security, LLC
13/ 149,773
May 31, 2011
FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT [0002] The United States Government has rights in this invention pursuant to Contract No. DE-AC52-07NA27344 between the United States Department of Energy and Lawrence Livermore National Security, LLC for the operation of Lawrence Livermore National Laboratory.