Skip to Content
Find More Like This
Return to Search

SYSTEMS AND METHODS FOR HIGH AND ULTRA-HIGH VACUUM PHYSICAL VAPOR DEPOSITION WITH IN-SITU MAGNETIC FIELD

United States Patent Application

20150125622
A1
View the Complete Application at the US Patent & Trademark Office
Systems and methods for high and ultra-high vacuum physical vapor deposition with in-situ magnetic field are disclosed herein. An exemplary method for depositing a film in an evacuated vacuum chamber can include introducing a sample into the vacuum chamber. The sample can be rotated. A magnetic field can be applied that rotates synchronously with the rotating sample. Atoms can be deposited onto the sample while the sample is rotating with the magnetic field to deposit a film while the magnetic field induces magnetic anisotropy in the film.
SHEPARD, KENNETH L. (Ossining, NY), Bailey, William E. (New York, NY), Sturcken, Noah Andrew (New York, NY), Cheng, Cheng (New York, NY), Zohar, Sioan (Lemont, IL)
The Trustees of Columbia University in HIe City of (New York NY)
14/ 504,083
October 1, 2014
STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH [0002] This invention is made with government support from the U.S. Department of Energy under Grant No. DE-EE0002892 and the National Science Foundation under Grant No. ECCS0925829. The Government has certain rights in the invention.