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Metallic Nanomesh

United States Patent Application

View the Complete Application at the US Patent & Trademark Office
A transparent flexible nanomesh having at least one conductive element and sheet resistance less than 300.OMEGA./.quadrature. when stretched to a strain of 200% in at least one direction. The nanomesh is formed by depositing a sacrificial film, depositing, etching, and oxidizing a first metal layer on the film, etching the sacrificial film, depositing a second metal layer, and removing the first metal layer to form a nanomesh on the substrate.
Ren, Zhifeng (Houston, TX), Sun, Tianyi (Waltham, MA), Guo, Chuanfei (Houston, TX)
14/ 298,090
June 6, 2014
STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT [0002] This work is supported by the U.S. Department of Energy under award number DE-FG02-13ER46917.