The present invention provides photosensitive compositions and methods of patterning a polymeric image on a substrate, said methods comprising; (a) depositing a layer of photosensitive composition of any one of claims 15 to 22 on the substrate; and (b) irradiating a portion of the layer of photosensitive composition with a light comprising a wavelength in a range of from about 220 to about 440 nm. The invention also relates to methods of metathesizing an unsaturated organic precursor comprising irradiating Fischer-type carbene ruthenium catalysts with at least one wavelength of light in the presence of at least one unsaturated organic precursor so as to metathesize at least one alkene or one alkyne bond.
 The subject matter disclosed herein was made with government support under awarded by the Department of Defense, Air Force Office of Scientific Research, National Defense Science and Engineering Graduate (NDSEG) Fellowship, 32 CFR 168a. This work was supported by the U.S. Department of Energy, Basic Energy Sciences "Light Matter Interactions in Energy Conversion" Energy Frontier Research Center (DOE-LMI-EFRC) under Grant No. DE-AC02-05CH11231. The Government has certain rights in the herein disclosed subject matter.