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METHOD AND SYSTEM FOR DAMAGE REDUCTION IN OPTICS USING SHORT PULSE PRE-EXPOSURE

United States Patent Application

20140138359
A1
View the Complete Application at the US Patent & Trademark Office
Lawrence Livermore National Laboratory - Visit the Industrial Partnerships Office Website
A method of processing an optical element includes providing the optical element. A surface region of the optical element includes one or more pre-cursors. The method also includes raster scanning a laser beam across the optical element. The laser beam comprises a plurality of laser pulses, each of the laser pulses being characterized by a pulse length less than 1 ns. The method further includes exposing the one or more pre-cursors to the laser beam and observing a light emission event from one of the one or more pre-cursors.
Carr, Christopher Wren (Livermore, CA), Negres, Raluca A. (Pleasanton, CA), Norton, Mary A. (Livermore, CA), Cross, David A. (Livermore, CA)
LAWRENCE LIVERMORE NATIONAL SECURITY, LLC (Livermore CA)
13/ 682,239
November 20, 2012
STATEMENT AS TO RIGHTS TO INVENTIONS MADE UNDER FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT [0001] The United States Government has rights in this invention pursuant to Contract No. DE-AC52-07NA27344 between the U.S. Department of Energy and Lawrence Livermore National Security, LLC, for the operation of Lawrence Livermore National Laboratory.