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APPARATUS FOR PROCESSING MATERIALS AT HIGH TEMPERATURES AND PRESSURES

United States Patent Application

20150122172
A1
View the Complete Application at the US Patent & Trademark Office
An apparatus for processing materials at high temperatures comprises a high strength enclosure; a plurality of high strength radial segments disposed adjacent to and radially inward from the high strength enclosure; a liner disposed adjacent to and radially inward from the radical segments; a chamber defined interior to the liner; a heating device disposed within the chamber; and a capsule disposed within the chamber, the capsule configured to hold a supercritical fluid. The apparatus may be used for growing crystals, e.g., GaN, under high temperature and pressure conditions.
Afimiwala, Kirsh (Shelton, CT), Zeng, Larry (Strongsville, OH)
MOMENTIVE PERFORMANCE MATERIALS, INC. (Waterford NY)
13/ 812,757
July 28, 2011
GOVERNMENT SPONSORSHIP [0002] This invention was made with United States government support awarded by the Department of Energy under Subaward Agreement for ARPA-E program DE-AR000020.