Skip to Content
Find More Like This
Return to Search

Silica Nano/Micro-Sphere Nanolithography Method by Solvent-Controlled Spin-Coating

United States Patent Application

View the Complete Application at the US Patent & Trademark Office
A method is provided for preparing an etching mask on a substrate. The method includes dispersing a plurality of particles in an aprotic suspending medium to form a suspension and spin-coating the suspension on a substrate to form an etching mask on the substrate.
Choi, Jeayoung (Chandler, AZ), Honsberg, Christiana (Tempe, AZ)
14/ 448,118
July 31, 2014
STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH [0002] This invention was made with government support under 1041895 awarded from the National Science Foundation and the Department of Energy. The United States government has certain rights in the invention.