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FLOW CELL DESIGN FOR UNIFORM RESIDENCE TIME FLUID FLOW

United States Patent Application

20130196053
A1
View the Complete Application at the US Patent & Trademark Office
Pacific Northwest National Laboratory - Visit the Technology Commercialization Program Website
Embodiments of a deposition reactor that compensates for lateral flow variation are disclosed. The reactor has at least one wall defining a deposition chamber comprising a first region and a second region, the wall having a purposely formed curvature defining a height of the deposition chamber. An inlet for a fluid comprising reactants or deposition material is in fluid communication with the deposition chamber. Portions of the fluid flowing through the deposition chamber have a residence time within the deposition chamber that varies by .ltoreq.20% across a cross-sectional width of the deposition chamber. The deposition chamber may further comprise an outlet in fluid communication with a third region. The reactor is suitable for depositing material layers having a uniform thickness. Methods of using the reactor also are disclosed.
Paul, Brian K. (Corvallis, OR), Hires, Clayton L. (Beaverton, OR), Chang, Chih-hung (Corvallis, OR)
State of Oregon acting by and through the State Board of Higher Education on behalf of Oregon Stat (Corvallis OR)
13/ 738,896
January 10, 2013
ACKNOWLEDGMENT OF GOVERNMENT SUPPORT [0002] This invention was made with government support under Prime Award No. DE-AC05-76RL01830 awarded by U.S. Department of Energy/Sub Award No. 57494-79791 awarded by Pacific Northwest National Laboratory. The government has certain rights in this invention.