Provided are silicon-containing films with a refractive index suitable for antireflection, articles having a surface comprising the films, and atmospheric-pressure plasma-enhanced chemical vapor deposition (AE-PECVD) processes for the formation of surface films and coatings. The processes generally include providing a substrate, providing a precursor comprising silicon, and reacting the precursor with a gas comprising nitrogen (N2) in a low-temperature plasma at atmospheric pressure, wherein the products of the reacting form a film on the substrate. An antireflection coating made by the process can have a refractive index of about 1.5 to about 2.2. Articles are provided having a surface that includes the antireflection coating.
FEDERALLY-SPONSORED RESEARCH AND DEVELOPMENT
 Activities relating to the development of the subject matter of this invention were funded at least in part by the U.S. Government, Department of Energy Grant Nos. DOE-PV-DS-43500 and DE-FC36-08G088160. The United States Government has certain rights in this invention.