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Ordered Nanoscale Domains by Infiltration of Block Copolymers

United States Patent Application

20120046421
A1
View the Complete Application at the US Patent & Trademark Office
Sequential Infiltration Synthesis Advances Lithography (IN-10-017, 10-106)
A method of preparing tunable inorganic patterned nanofeatures by infiltration of a block copolymer scaffold having a plurality of self-assembled periodic polymer microdomains. The method may be used sequential infiltration synthesis (SIS), related to atomic layer deposition (ALD). The method includes selecting a metal precursor that is configured to selectively react with the copolymer unit defining the microdomain but is substantially non-reactive with another polymer unit of the copolymer. A tunable inorganic features is selectively formed on the microdomain to form a hybrid organic/inorganic composite material of the metal precursor and a co-reactant. The organic component may be optionally removed to obtain an inorganic feature s with patterned nanostructures defined by the configuration of the microdomain.
Darling, Seth B. (Chicago, IL), Elam, Jeffrey (Elmhurst, IL), Tseng, Yu-Chih (Westmont, IL), Peng, Qing (Downers Grove, IL)
UCHICAGO ARGONNE, LLC
13/ 209,190
August 12, 2011
STATEMENT OF GOVERNMENT INTEREST [0002] The United States Government has rights in this invention pursuant to Contract No. DE-AC02-06CH11357 between the United States Government and the UChicago Argonne, LLC, representing Argonne National Laboratory.