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Microchannel plate photocathode

United States Patent Application

View the Complete Application at the US Patent & Trademark Office
An energy-enhanced, low-temperature growth technique is used for direct deposition of periodic table column III nitrides-based negative electron affinity (NEA) photocathodes on standard glass microchannel plates (MCPs.) As working examples, low-temperature RF plasma-assisted molecular beam epitaxy growth (MBE) of p-type GaN layers on sapphire, quartz, and glass and alumina MCPs and their photoemission characterization is disclosed.
Dabiran, Amir Massoud (Chanhassen, MN)
12/ 462,387
August 3, 2009
STATEMENT OF GOVERNMENT INTEREST [0002] The U.S. Department of Energy provided funding under contract #DE-FG02-06ER84506. The Government has certain rights in this invention.