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Use of ion beams for protecting substrates from particulate defect contamination in ultra-low-defect coating processes

United States Patent Application

20040055871
A1
View the Complete Application at the US Patent & Trademark Office
Lawrence Livermore National Laboratory - Visit the Industrial Partnerships Office Website
A method and means are provided for actively protecting a substrate from particulate contamination during thin film deposition. An intense beam of ions or ionized clusters is directed through the space immediately in front of the surface being coated, and the kinetic energy of the ions is used to deflect any approaching particle defects to the side, preventing them from reaching the surface being coated.
Walton, Christopher C. (Berkeley, CA), Folta, James A. (Livermore, CA)
The Regents of the University of California
10/ 254,119
September 25, 2002
[0001] The United States Government has rights in this invention pursuant to Contract No. W-7405-ENG-48 between the United States Department of Energy and the University of California for the operation of Lawrence Livermore National Laboratory.