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Nanolithography molecular beam machine

United States Patent Application

20030213922
A1
View the Complete Application at the US Patent & Trademark Office
A method of directly writing on a surface of a substrate with neutral molecules uses a collimated beam of neutral molecules having a first direction of travel, a laser light energy field having a second direction of travel; and intersects the laser light energy field with the collimated beam of neutral molecules at a grazing angle of incidence between the first direction of travel and the second direction of travel to control the formation of features comprising the neutral molecules on the surface of the substrate.
Gordon, Robert J. (Skokie, IL), Seideman, Tamar (Evanston, IL), Zhu, Langchi (Oak Park, IL), Schroeder, Andreas (Downers Grove, IL)
The Board of Trustees of the University of Illinois, University of Illinois (Chicago IL), Steacie Institute for Molecular Science, National Research Council of Canada (Ottawa)
10/ 437,620
May 14, 2003
[0002] This invention was made with government support under Grant No. DE-FG02-98ER14880 awarded by the Chemical Sciences, Geosciences and Biosciences Division of the Office of Basic Energy Sciences, Office of Science, U.S. Department of Energy. The U.S. government has certain rights in the invention.